Product Details:
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Application: | Microelectronics , Optoelectronics And RF Microwave | Diameter: | Ø 3" / Ø 4" GaAs Wafer |
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Thickness: | 500 Um ~ 625 Um | Grade: | Epi Polished Grade / Mechanical Grade |
Highlight: | GaAs Based Epi Wafer,625Um Epi Wafer,Polished Grade epiwafer |
GaAs Based Epi Wafer
We provides MBE / MOCVD epitaxial growth of custom structure on GaAs substrate for microelectronics , optoelectronics and RF Microwave applications , in diameter Ø 3" to Ø 4” . With our extensive MOCVD experience , we can grow binary alloy ( LT-GaAs , AlAs ) or ternary alloy ( AlGaAs , InGaAs ,GaAsP , InGaP ) on GaAs substrate , singel layer or multiple-layer superlattice structures with superior crystalline quality to meet a variety of device needs . Our highly skilled experts can work with you to design and optimize your GaAs epi layer structure . Please contact us for more product information or discuss your epi layer structure .
Our reactors are configured for a variety of material systems and process conditions. We can provide custom epitaxy for a variety of device applications ranging from LEDs to HEMTs .
Material Capability | Substrate | Wafer Size |
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GaAs/GaAs | GaAs wafer | Up to 4 inch |
LT-GaAs/GaAs | GaAs wafer | Up to 4 inch |
AlAs/GaAs | GaAs wafer | Up to 4 inch |
InAs/GaAs | GaAs wafer | Up to 4 inch |
AlGaAs/GaAs | GaAs wafer | Up to 4 inch |
InGaAs/GaAs | GaAs wafer | Up to 4 inch |
InGaP/GaAs | GaAs wafer | Up to 4 inch |
GaAsP/GaAs | GaAs wafer | Up to 4 inch |
Optoelectronic applications:
Photodetectors, VCSELs, laser diodes, LEDs, SOAs, Waveguides.
Electronic applications:
FETs, HBTs, HEMTs, diodes, Microwave devices.
Epi Layer Structure ( HEMT / HBT )
Growth | MOCVD |
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Dopant source | P type / Be , N type / Si |
Cap layer | i-GaAs layer |
Active layer | n-AlGaAs layer |
Space layer | i-AlGaAs layer |
Buffer layer | i-GaAs layer |
Substrate | Ø 3" / Ø 4" GaAs wafer |
Contact Person: Daniel
Tel: 18003718225
Fax: 86-0371-6572-0196